ASML Holding NV, formerly ASM Lithography Holding N.V. was incorporated in the Netherlands on October 3, 1994 to serve as the holding company for its operations, which include operating subsidiaries in the Netherlands, the United States, Italy, France, Germany, the United Kingdom, Ireland, Belgium, Korea, Taiwan, Singapore, China (including Hong Kong), Japan, Malaysia and Israel. In 2001, the Company changed its name to ASML Holding NV. The Company is a provider of lithography systems for the semiconductor industry, manufacturing complex machines that are critical to the production of integrated circuits or chips. The TWINSCAN NXE is the production platform for extreme ultraviolet lithography (EUVL). The NXE:3300B is the successor to the NXE:3100, offering 22 nm resolution with conventional illumination and 18 nm with off-axis illumination. The TWINSCAN NXT:1960Bi Step-and-Scan system is a dual-stage immersion lithography system designed for volume production 300-mm wafers at the 2x-nm node and beyond. The TWINSCAN XT:1950Hi Step-and-Scan system takes single-exposure water-based immersion lithography to its limits. This dual-stage immersion lithography tool is designed for volume production on 300-mm wafers at 38-nm resolution and beyond. The PAS 5500/1150C 193-nm Step-and-Scan system enables 90-nm ArF mass production. The PAS 5500/1150C is the solution for 90-nm critical and non critical ArF layers. The PAS 5500/1150C can be configured with a number of options that enable low-k1 in manufacturing, extending application of the PAS 5500/1150C below 90 nm. The Company's business is subject to direct and indirect regulations in each of the countries.
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