Ultratech to Present at 27th Annual Roth Conference on March 10

SAN JOSE, Calif.--(BUSINESS WIRE)--

Ultratech, Inc. UTEK a leading supplier of lithography, laser-processing and inspection systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs), today announced that it will present at the 27^th Annual Roth Conference on Tuesday, March 10, 2015, at 8:30 a.m. PT in Laguna Niguel, California.

A live webcast of the presentation will be available on Ultratech's website at http://ir.ultratech.com/ and an archive will be available for 30 days following the event.

About Ultratech: Ultratech, Inc. UTEK designs, builds and markets manufacturing systems for the global technology industry. Founded in 1979, Ultratech serves three core markets: front-end semiconductor, back-end semiconductor, and nanotechnology. The company is the leading supplier of lithography products for bump packaging of integrated circuits and high-brightness LEDs. Ultratech is also the market leader and pioneer of laser spike anneal technology for the production of advanced semiconductor devices. In addition the company offers solutions leveraging its proprietary coherent gradient sensing (CGS) technology to the semiconductor wafer inspection market, and provides atomic layer deposition (ALD) tools to leading research organizations, including academic and industrial institutions. Visit Ultratech online at: www.ultratech.com.

(UTEK-F)