ASML Up 11% On Key Technology Breakthrough

is up more than 11 percent in pre-market trading as a result of new developments in EUV (Extreme Ultraviolet) technologies, the lighting source used in lithography machines. According to

, ASML's EUV technology was implemented into

NXE3300B scanner. The implementation of a 40W EUV light source upgrade resulted in 657 wafer exposure completion, which came ahead of expectation of 500 wafer exposure completion. This is being viewed as a positive development for ASML, as it confirms that extreme ultraviolet light will replace deep ultraviolet light in lithography.