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Zygo Corporation
ZIGO today announced that its Optical Systems Division was awarded an order of over $2 million in March by a major semiconductor manufacturer to produce Extreme UltraViolet optics used in the development of advanced lithography processes. This order is associated with the CSNE/SEMATECH consortium Micro Exposure Tool (MET-5) program that will help researchers achieve line widths of less than 16 nanometers in support of semiconductor roadmaps projected out to the year 2025.
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